Nā huahana
Pauka Silicon Carbide ʻEleʻele 98% Sic Silicon Carbide ʻEleʻele
ʻEleʻele Silicon Carbide
Ma muli o ka laha ʻole o ka moissanite kūlohelohe, ʻo ka hapa nui o ka silicon carbide he synthetic. Hoʻohana ʻia ia ma ke ʻano he abrasive, a ʻoi aku ka manawa hou ma ke ʻano he semiconductor a me ka diamond simulant o ke ʻano gem. ʻO ke kaʻina hana maʻalahi loa, ʻo ia ka hoʻohui ʻana i ke one silica a me ke kalapona i loko o ka umu pale uila Acheson graphite ma kahi mahana kiʻekiʻe, ma waena o 1,600 °C (2,910 °F) a me 2,500 °C (4,530 °F). Hiki ke hoʻololi ʻia nā ʻāpana SiO2 maikaʻi i loko o nā mea kanu (e like me nā ʻōpala laiki) i SiC ma ka hoʻomehana ʻana i ke kalapona keu mai ka mea organik. ʻO ka silica fume, kahi huahana o ka hana ʻana i ka metala silicon a me nā ferrosilicon alloys, hiki ke hoʻololi ʻia i SiC ma ka hoʻomehana ʻana me ka graphite ma 1,500 °C (2,730 °F).
Loaʻa ka nui o ka ʻeleʻele Silicon Carbide
F12-F1200, P12-P2500
0-1mm, 1-3mm, 6/10, 10/18, 200mesh, 325mesh
Hiki ke hoʻolako ʻia nā kikoʻī kūikawā ʻē aʻe ma ke noi.
ʻO ka hoʻohuihui kemika Silicon Carbide ʻeleʻele (%)
| ʻOluʻolu | ʻO Sic | FC | Fe2O3 |
| F12-F90 | ≥98.50 | <0.20 | ≤0.60 |
| F100-F150 | ≥98.00 | <0.30 | ≤0.80 |
| F180-F220 | ≥97.00 | <0.30 | ≤1.20 |
| F230-F400 | ≥96.00 | <0.40 | ≤1.20 |
| F500-F800 | ≥95.00 | <0.40 | ≤1.20 |
| F1000-F1200 | ≥93.00 | <0.50 | ≤1.20 |
| P12-P90 | ≥98.50 | <0.20 | ≤0.60 |
| P100-P150 | ≥98.00 | <0.30 | ≤0.80 |
| P180-P220 | ≥97.00 | <0.30 | ≤1.20 |
| P230-P500 | ≥96.00 | <0.40 | ≤1.20 |
| P600-P1500 | ≥95.00 | <0.40 | ≤1.20 |
| P2000-P2500 | ≥93.00 | <0.50 | ≤1.20 |
Papa Kuhikuhi Kino Silicon Carbide ʻEleʻele
| Nā ʻuala palai | Ka nui o ka nui (g/cm3) | Ka nui o ka paʻa (g/cm3) | Nā ʻuala palai | Ka nui o ka nui (g/cm3) | Ka nui o ka paʻa (g/cm3) |
| F16 ~ F24 | 1.42~1.50 | ≥1.50 | F100 | 1.36~1.45 | ≥1.45 |
| F30 ~ F40 | 1.42~1.50 | ≥1.50 | F120 | 1.34~1.43 | ≥1.43 |
| F46 ~ F54 | 1.43~1.51 | ≥1.51 | F150 | 1.32~1.41 | ≥1.41 |
| F60 ~ F70 | 1.40~1.48 | ≥1.48 | F180 | 1.31~1.40 | ≥1.40 |
| F80 | 1.38~1.46 | ≥1.46 | F220 | 1.31~1.40 | ≥1.40 |
| F90 | 1.38~1.45 | ≥1.45 |
- Wili a me ka Polishing: wehe i nā mea, hoʻomaʻemaʻe i nā ʻili, a me ka hoʻokō ʻana i nā hoʻopau ʻili i makemake ʻia
- Nā mea hoʻopōʻino i uhi ʻia: pepa one, nā kāʻei hoʻopōʻino, a me nā diski
- ʻOihana Semiconductor: Hoʻohana ʻia no ka ʻokiʻoki ʻana a me ka ʻoki ʻana i nā ʻots silicon a me ka hoʻokō ʻana i nā ʻoki pololei me ka liʻiliʻi o ka pohō waiwai a me ka hōʻino ʻana o ka ʻili.
- Nā mea hoʻoheheʻe a me nā keramika: e hana ana i nā ipu hoʻoheheʻe, nā lako umu, a me nā ʻāpana wela kiʻekiʻe ʻē aʻe.
- Nā noi Metallurgical
- ʻoki uea
- Ka hoʻopāhū ʻana i nā mea ʻino: ka hoʻomaʻemaʻe ʻana i ka ʻili, ke kālai ʻana, a me ka hoʻomākaukau ʻana ma nā ʻoihana e like me ke kūkulu ʻana, ka hana metala, a me ke kaʻa.
- Ka Hoʻomaʻemaʻe ʻana i nā Daimana: ke hoʻoponopono ʻana, wili ʻana, a me ka hoʻowali ʻana i nā ʻili daimana e hoʻonui i ko lākou ʻālohilohi a me nā waiwai maka.
- Nā Hana o ka Hale Hana Metala: ka hoʻopāpā ʻana i ke one, ka hoʻomākaukau ʻana i ka ʻili, a me ka hoʻomaʻemaʻe ʻana i nā mea i hoʻoheheʻe ʻia metala.
Kāu Nīnau
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