luna_hope

Nā huahana

ʻO ka pāpaʻi hana hoʻopōʻaiapuni kiʻekiʻe nā nui āpau o ka pauka maikaʻi silicon carbide ʻōmaʻomaʻo gsic no ka hoʻopili ʻana a me ka wili ʻana


  • Waihoʻoluʻu:ʻōmaʻomaʻo
  • ʻIkepili:>98%
  • Minerala Kumu:α-SiC
  • ʻAno aniani:Kilika hexagonal
  • Paʻakikī Mohs:3300kg/mm3
  • Ka nui maoli:3.2g/mm
  • Ka nui o ka nui:1.2-1.6g/mm3
  • Ke kaumaha kikoʻī:3.20-3.25
  • Nā kikoʻī huahana

    PALAPALA NOI

    Hoʻolauna ʻo Green Silicon Carbide

    ʻO ka pauka silicon carbide ʻōmaʻomaʻo kahi mea abrasive kiʻekiʻe e hoʻohana ʻia no nā ʻano hana like ʻole e like me ka polishing a me ke oneblasting. Ua kaulana ia no kona paʻakikī maikaʻi loa, ka hiki ke ʻoki kupaianaha, a me ka ikaika kiʻekiʻe. Hana ʻia ka silicon carbide ʻōmaʻomaʻo ma ka hoʻomehana ʻana i ka hui ʻana o ke one silica a me ke kalapona i nā mahana kiʻekiʻe i loko o ka umu uila. ʻO ka hopena he mea crystalline me kahi waihoʻoluʻu ʻōmaʻomaʻo nani.

    gsic (58)
    gsic (52)
    gsic (6)

    ʻO ka waiwai kino o ka Silicon Carbide ʻōmaʻomaʻo

     

    Waiwai kino
    ʻAno aniani Hexagonal
    Ka nui o ka nui 1.55-1.20g/cm3
    Ka nui o ka palaoa 3.90g/cm3
    Paʻakikī Mohs 9.5
    Paʻakikī Knoop 3100-3400 Kg/mm2
    Ikaika wāwahi 5800 kPa·cm-2
    Waihoʻoluʻu ʻōmaʻomaʻo
    Kiko heheʻe 2730ºC
    Ka hoʻokele wela (6.28-9.63)W·m-1·K-1
    Ka helu hoʻonui laina (4 - 4.5)*10-6K-1(0 - 1600 C)
    Ka nui Ka hoʻolaha ʻana o ka palaoa Ka Hoʻohui Kemika (%)
      D0 ≤ D3 ≤ D50 D94 ≥ SiC ≥ FC ≤ Fe2O3≤
    #700 38 30 17±0.5 12.5 99.00 0.15 0.15
    #800 33 25 14±0.4 9.8 99.00 0.15 0.15
    #1000 28 20 11.5±0.3 8.0 98.50 0.25 0.20
    #1200 24 17 9.5±0.3 6.0 98.50 0.25 0.20
    #1500 21 14 8.0±0.3 5.0 98.00 0.35 0.30
    #2000 17 12 6.7±0.3 4.5 98.00 0.35 0.30
    #2500 14 10 5.5±0.3 3.5 97.70 0.35 0.33
    #3000 11 8 4.0±0.3 2.5 97.70 0.35 0.33

     


  • Ma mua:
  • Aʻe:

    1. Wili a me ka ʻoki ʻana: wili pololei o nā metala paʻakikī, nā mea seramika, a me ke aniani
    2. Hoʻokala a me ka Honing: hoʻokala a me ka honing ʻana i nā mea ʻoki e like me nā pahi, nā ʻoki, a me nā pahi
    3. Ka hoʻopāhū ʻana i ka ʻili: ka hoʻomākaukau ʻana i ka ʻili, ka hoʻomaʻemaʻe ʻana, a me nā noi etching
    4. Ka Polishing a me ka Lapping: ka polishing pololei o nā aniani, nā aniani, a me ka polishing wafer semiconductor
    5. ʻOki uea: nā wafers silicon, nā pōhaku makamae, a me nā keramika
    6. ʻOihana Refractory a me Ceramic: hana ʻana i nā ipu hoʻoheheʻe, nā lako umu, a me nā ʻāpana wela kiʻekiʻe ʻē aʻe
    7. ʻOihana Semiconductor:
    8. Nā noi Metallurgical

     

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